Increasing the accuracy of 3D EEG implantations

Roman Rodionov*, Aidan O'Keeffe, Mark Nowell, Michele Rizzi, Vejay N. Vakharia, Victoria Wykes, Sofia H. Eriksson, Anna Miserocchi, Andrew W. McEvoy, Sebastien Ourselin, John S. Duncan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

OBJECTIVE The accuracy of stereoelectroencephalography (SEEG) electrode implantation is an important factor in maximizing its safety. The authors established a quality assurance (QA) process to aid advances in implantation accuracy. METHODS The accuracy of three consecutive modifications of a frameless implantation technique was quantified in three cohorts comprising 22, 8, and 23 consecutive patients. The modifications of the technique aimed to increase accuracy of the bolt placement. RESULTS The lateral shift of the axis of the implanted bolt at the level of the planned entry point was reduced from a mean of 3.0 ± 1.6 mm to 1.4 ± 0.8 mm. The lateral shift of the axis of the implanted bolt at the level of the planned target point was reduced from a mean of 3.8 ± 2.5 mm to 1.6 ± 0.9 mm. CONCLUSIONS This QA framework helped to isolate and quantify the factors introducing inaccuracy in SEEG implantation, and to monitor ongoing accuracy and the effect of technique modifications.

Original languageEnglish
Pages (from-to)35-42
Number of pages8
JournalJournal of Neurosurgery
Volume133
Issue number1
DOIs
Publication statusPublished - Jul 2020
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2020 AANS.

Keywords

  • Accuracy
  • Epilepsy
  • Implantation
  • Quality assurance
  • SEEG

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